倫倫的小blog

EUV related

The Extreme Physics Pushing Moore's Law to the Next Level

How An EUV Light Source Works

EUV : Grand Challenges : Part 1

EUV : Grand Challenges : Part 2

lithography related

Double Patterning to the rescue (LELE, LFLE, SADP) - Part 1

LELE = litho-etch-litho-etch

LFLE = litho-freeze-litho-ecth

SADP = self-align double patterning

see wiki Multiple patterning

Double Patterning to the rescue (Self Aligned Double Patterning) - Part 2

note: basically, part2 repeats mostly part1, and so one can skip it.

Tricks in Lithography : Part 1 (Immersion Lithography)

Tricks in Lithography : Part 2 (OPC, PSM, Off Axis Illumination)

Resolution enhancement technique (RET)

CD = k1 * lamda / NA

# immersion

=> NA ~= 0.93 * reflection index n

# source/mask optimization (SMO)

mask side:

 -- optical proximity correction (OPC)

 -- phase-shift mask (PSM)

source side:

 -- off-axis (OAI)

(ILT)

Lecture 57 (CHE 323) Lithography RET, part 1

Lecture 58 (CHE 323) Lithography RET, part 2

 Lecture 59 (CHE 323) Lithography Double Patterning

 Transistors, How do they work ?

 Front End Of Line : Part 1